GCIB (Gas Cluster Ion Beam) device
It features a compact structure with a simple and low-cost design. Achieves ultra-flat processing and damage-free processing! Ideal for surface modification and high-quality thin film formation.
This device can achieve ultra-smoothing and modification of surfaces with low damage by irradiating a beam (GCIB) that ionizes and accelerates a group of tens to tens of thousands of gas atoms or molecules at moderate energy onto unprocessed materials. Due to the atomic and molecular level processing, it is possible to smooth, etch, and surface process already shaped fine structures. 【Features】 ■ Suitable for nano-order fine processing ■ Flattening processing with Ra of a few nanometers ■ Compatible with reactive gas treatment ■ Processing possible at substrate surface temperatures below 100°C For more details, please contact us or download the catalog.
- 企業：アールエムテック
- 価格：Other
